Core contributor to MADEin4 (metrology for digitized ECS), 3DAM (3D Advanced Metrology), and measurement workstreams across IT2, ID2PPAC, PIN3S, TAPES3, TAKEMI5, and TAKE5.
NOVA LTD
Israeli semiconductor metrology company providing advanced measurement and process control systems for Europe's sub-10nm chip manufacturing R&D programs.
Their core work
Nova Ltd is an Israeli semiconductor metrology and process control company that develops advanced measurement and inspection systems for chip manufacturing. Within H2020, they provide critical metrology equipment and expertise enabling Europe's push toward sub-10nm semiconductor nodes. Their tools allow fabs and pilot lines to characterize, measure, and control nanoscale manufacturing processes — from lithography and deposition to final device inspection. They are a key equipment supplier embedded in Europe's most ambitious semiconductor R&D consortia.
What they specialise in
Continuous participation from SeNaTe (7nm) through TAKE5/TAKEMI5 (5nm), TAPES3/PIN3S (3nm), to IT2/ID2PPAC (2nm), tracking every major node shrink.
Keywords 'equipment' and 'materials' appear consistently from TAKEMI5 through ID2PPAC, reflecting their role as an equipment vendor enabling process development.
CHALLENGES project focused on Raman spectroscopy, photoluminescence, scanning probe microscopy, and inline control for CMOS and PV cells.
IT2 and ID2PPAC both list DTCO and STCO as keywords, indicating Nova's metrology is being integrated into the design-technology feedback loop at 2nm.
How they've shifted over time
In their early H2020 participation (2015–2017), Nova focused broadly on semiconductor process enablement across diverse areas including power electronics (R3-PowerUP) and general advanced node R&D (SeNaTe, WAYTOGO FAST). From 2018 onward, their work sharpened dramatically toward metrology, inspection, and process control — culminating in MADEin4 (their largest project at €2M+) and the 2nm-node projects IT2 and ID2PPAC where metrology, lithography, and DTCO/STCO became central keywords. The trajectory shows a company that moved from general consortium participation to becoming a recognized metrology specialist deeply embedded in Europe's semiconductor roadmap.
Nova is moving toward integrated metrology-driven process control at the 2nm node and beyond, with growing involvement in design-technology co-optimization — making them a strong partner for any next-generation semiconductor manufacturing initiative.
How they like to work
Nova operates exclusively as a specialist participant — they have never coordinated an H2020 project, instead contributing deep domain expertise to large consortia. With 185 unique partners across 23 countries, they are a highly connected hub in Europe's semiconductor R&D ecosystem, likely partnering with the same major fabs, research institutes (e.g., imec, CEA-Leti, Fraunhofer), and equipment vendors project after project. Their consistent participation across successive node-shrink projects suggests they are a trusted, long-term partner valued for reliable equipment-side contributions rather than project leadership.
Nova has built an extensive European network spanning 185 unique partners across 23 countries, placing them among the most connected semiconductor equipment suppliers in H2020. Their partnerships are concentrated within the ECSEL/digital electronics ecosystem, connecting them to Europe's top semiconductor fabs, equipment makers, and research institutes.
What sets them apart
Nova is one of the few non-European semiconductor metrology companies deeply embedded in Europe's most strategic chip manufacturing R&D programs, from 7nm down to 2nm. Their consistent presence across every major node-shrink project means they bring continuity and institutional knowledge that newer entrants cannot match. For consortium builders, Nova offers both world-class metrology capabilities and a bridge to the Israeli semiconductor ecosystem.
Highlights from their portfolio
- MADEin4Their largest project (€2M+ funding), focused squarely on their core strength — metrology for digitized manufacturing with AI-driven process control.
- ID2PPACTheir most recent and ambitious project, targeting 2nm integration with emphasis on power-performance-area-cost optimization — representing the frontier of semiconductor R&D.
- CHALLENGESUnusual diversification into nanoscale characterization techniques (Raman, photoluminescence, scanning probe) for both CMOS and photovoltaic applications, bridging semiconductor and energy sectors.