Making computer chips currently requires using harsh, toxic chemicals to etch tiny patterns onto silicon. Imagine replacing those dangerous solvents with something as simple as water or plant-based materials. This project creates a cleaner way to print these circuits without losing the precision needed for high-tech electronics.
Semiconductor manufacturing relies on toxic organic solvents and alkaline solutions (TMAH) that cause environmental deterioration and create hazardous waste streams.
Three green photoresist material platforms (bio-sourced and synthetic) and AI-driven metrology techniques using AFM-SEM for performance evaluation.
If you are a chip fabrication plant dealing with toxic waste and hazardous chemical regulations — this project developed three green material platforms that replace organic solvents and alkaline solutions with water. This reduces the environmental footprint of the lithography process while maintaining high resolution.
If you are a hardware manufacturer dealing with supply chain sustainability audits — this project developed bio-sourced resist materials for 193 nm, 248 nm, and EUV exposure. This allows for the production of components with a significantly lower environmental impact.
If you are a chemical supplier dealing with the phase-out of hazardous TMAH solutions — this project developed new synthetic polymer-based photoresist platforms. These materials enable a transition to green processing in the semiconductor industry.
Based on available project data, specific pricing or cost-reduction figures are not provided; the focus is on replacing expensive or hazardous solvents with water and bio-sourced materials.
Yes, the project aims for industrial viability and includes STMicroelectronics as a partner, with ASML expressing interest in the technology.
Based on available project data, specific licensing terms are not listed, but the project involves a consortium of 9 partners including industry and research entities.
The project targets the elimination or drastic reduction of organic solvents and highly alkaline TMAH solutions used in the lithographic process.
The project runs from 2024-01-01 to 2027-06-30, aiming to reach TRL4 by the end of the period.
The consortium is research-heavy with 5 research organizations and 2 universities, but maintains a critical industrial link with a 22% industry ratio. The inclusion of STMicroelectronics as a partner and the expressed interest from ASML indicates a strong pathway from lab to fab, ensuring the 3 developed platforms meet actual industrial requirements.
Contact the National Center for Scientific Research Demokritos in Greece.
Contact us to facilitate a partnership with the RESIN GREEN consortium for early adoption of green resists.
