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CONCEPT · Project

Energy-Efficient Computing Hardware Using Advanced Oxide Materials and Atomic Layer Deposition

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Imagine if computer chips could think more like a human brain while using far less power. Instead of relying on old silicon methods that are hitting a wall, this work uses a special 'atomic painting' technique to add thin layers of smart crystals to hardware. This allows devices to process information faster and stay cool without using toxic materials.

By the numbers
3,888,904
EU Contribution in EUR
9
Total partners
56%
Industry ratio
The business problem

What needed solving

Traditional silicon chips are reaching their physical limits, leading to higher energy consumption and slower performance. Europe also lacks technological sovereignty in the semiconductor supply chain.

The solution

What was built

Pre-prototype devices integrating ferroelectric (Hf,Zr)O2 and BaTiO3 films via atomic layer deposition.

Audience

Who needs this

Semiconductor foundriesAI hardware startupsOptical networking companiesLow-power electronics manufacturers
Business applications

Who can put this to work

Semiconductor Manufacturing
enterprise
Target: Chip fabrication plant

If you are a chip fabrication plant dealing with the physical limits of silicon and high energy consumption — this project developed a way to integrate epitaxial complex oxides using atomic layer deposition that enables low-power electronics.

Artificial Intelligence Hardware
SME
Target: Neuromorphic chip designer

If you are a neuromorphic chip designer dealing with the need for brain-like computing architectures — this project developed proof-of-concept devices using ferroelectrics that boost energy efficiency in computing hardware.

Telecommunications
mid-size
Target: Optical communication equipment provider

If you are an optical communication equipment provider dealing with the demand for faster data transmission — this project developed functional materials for photonic devices that improve light-based computing and communication.

Frequently asked

Quick answers

What is the estimated cost or price of implementing this technology?

Based on available project data, specific unit costs or pricing models are not provided; however, the project is supported by an EU contribution of EUR 3,888,904 to develop the technology.

Can this be produced at an industrial scale?

Yes, the project specifically focuses on producing high-quality oxide materials under industry-compatible conditions using atomic layer deposition to bridge the gap to commercial applications.

How is the IP and licensing handled for these new materials?

Based on available project data, specific licensing terms are not listed, but the project involves 5 industry partners and 4 SMEs to drive entrepreneurship and value creation.

How does this integrate with existing silicon technology?

The project uses atomic layer deposition to enable low-temperature integration of functional complex oxides directly into semiconductor-based devices.

What is the timeline for market availability?

The project period runs from 2024-01-01 to 2027-12-31, suggesting that commercial readiness will be evaluated toward the end of 2027.

Consortium

Who built it

The consortium is heavily industry-weighted with a 56% industry ratio, comprising 5 industrial partners (including 4 SMEs) and 3 universities. This structure suggests a strong focus on commercial translation rather than pure academic research, with a diverse geographic spread across 6 countries including Norway, Finland, and the Netherlands.

How to reach the team

Contact Universitetet i Oslo

Next steps

Talk to the team behind this work.

Contact us to connect with the CONCEPT consortium for early adoption of low-power oxide electronics.