MADEin4 (2019–2022) was explicitly focused on metrology advances for the digitized ECS industry, with ECP contributing to inspection and measurement platform development.
ECP
French SME building AI-driven metrology and inspection platforms for semiconductor and electronics manufacturing, with proven ECSEL consortium experience.
Their core work
ECP is a French technology SME based in Montpellier that develops metrology, automated inspection, and process control solutions for advanced electronics and semiconductor manufacturing. Their work involves building software platforms that measure and monitor quality at micro and nano scales, applying artificial intelligence and edge computing to detect defects and control manufacturing processes in real time. In their most recent project, MADEin4, they contributed to creating a common metrology and digitization platform for the European Electronic Components and Systems (ECS) industry under the Industry 4.0 framework. Their earlier participation in SeNaTe placed them inside the European research effort on 7-nanometer semiconductor node technology, indicating deep roots in precision fabrication environments.
What they specialise in
Both SeNaTe and MADEin4 involve manufacturing process environments — SeNaTe at 7nm semiconductor level, MADEin4 at ECS factory floor level with process control keywords.
MADEin4 keywords include artificial intelligence, multi-variant statistics, and common platform, pointing to ML-driven defect detection or statistical process monitoring.
MADEin4 keywords explicitly include cyber, physical, system, edge, and HPC, suggesting ECP works at the hardware–software integration layer for connected factory infrastructure.
SeNaTe (2015–2018) addressed 7-nanometer semiconductor technology, placing ECP in the European advanced node fabrication research ecosystem early in the H2020 period.
How they've shifted over time
In the 2015–2018 period, ECP's participation in SeNaTe placed them in the domain of cutting-edge semiconductor node research at 7nm scale — a highly specialized environment where precision tooling and process support are critical. By 2019–2022, their work had broadened into digitized manufacturing for the ECS industry more widely, with MADEin4 introducing AI, metrology platforms, and cyber-physical system concepts that signal a shift from narrow semiconductor process work toward scalable, intelligence-driven quality systems. The trajectory points clearly toward AI-augmented factory automation and connected inspection infrastructure, moving away from single-node semiconductor research and toward cross-factory digital transformation.
ECP is moving toward building reusable AI-driven inspection and metrology platforms for the broader electronics manufacturing sector, positioning them as a software and systems contributor in smart factory and Industry 4.0 consortia.
How they like to work
ECP participates exclusively as a consortium member — they have never led an H2020 project. Both of their projects are large ECSEL JU programs, which routinely involve 30–60 partners; this explains their unusually high partner count of 87 unique organizations from just two projects. This pattern suggests ECP operates as a focused technical specialist within large industry-led programs, contributing a defined capability rather than driving the research agenda.
ECP has co-worked with 87 unique partner organizations across 13 countries, a remarkably broad network for an SME with only two projects — a direct result of joining two large ECSEL JU consortia that include major semiconductor companies, research institutes, and equipment makers across Europe. Their network is pan-European and anchored in the ECS industry cluster rather than in a single national ecosystem.
What sets them apart
ECP occupies a rare niche as a French SME with hands-on experience in both leading-edge semiconductor research (7nm node) and the digitization of broader electronics manufacturing — few small firms have bridged both levels of the ECS supply chain in successive EU projects. Their size makes them agile within large consortia while their ECSEL track record signals proven ability to operate alongside major industrial players such as STMicroelectronics, Infineon, and similar ECSEL regulars. For a consortium seeking a technically credible, flexible metrology or inspection software partner with proven large-program experience, ECP offers a low-overhead entry point with specific domain depth.
Highlights from their portfolio
- MADEin4Their largest and most technically detailed project (EUR 104,031), directly focused on AI-driven metrology and ECS Industry 4.0 digitization — the clearest window into ECP's core competence.
- SeNaTeTheir earliest H2020 participation, placing ECP inside European 7nm semiconductor research at a time when very few SMEs had access to that level of the fabrication ecosystem.