Coordinated the entire node-progression series from SeNaTe (7nm) through TAKE5 and TAKEMI5 (5nm), TAPES3 and PIN3S (3nm), to IT2 and ID2PPAC (2nm).
ASML NETHERLANDS B.V.
World-leading lithography equipment manufacturer driving Europe's semiconductor roadmap from 7nm to 2nm through large-scale industrial pilotlines.
Their core work
ASML is the world's dominant manufacturer of photolithography systems used to produce semiconductor chips. Within H2020, they drive the European semiconductor roadmap by coordinating large-scale pilotline projects that push chip manufacturing from 7nm down to 2nm nodes. Their work spans lithography equipment, metrology tools, and process integration — the core machinery that every advanced chipmaker depends on. They translate Moore's Law ambitions into production-ready manufacturing technology.
What they specialise in
Projects like TAPES3, PIN3S, IT2, and ID2PPAC all focus on integrating lithography, metrology, and materials into viable manufacturing processes at each node.
IT2 and ID2PPAC explicitly list metrology as a keyword alongside lithography, and PIN3S targets nano-scale equipment development.
IT2 and ID2PPAC both include DTCO and STCO keywords, signaling a move from pure equipment development toward system-level design-process co-optimization.
Participated as third party in PAM^2 (precision additive metal manufacturing) and ConFlex (control of flexible structures), likely contributing motion control and precision engineering expertise.
How they've shifted over time
ASML's early H2020 work (2015–2018) focused on pushing semiconductor equipment from the 7nm node (SeNaTe) to 5nm (TAKE5, TAKEMI5), with keywords centered on "semiconductor process" and "equipment and materials." From 2019 onward, the focus sharpened to 3nm and 2nm nodes while broadening technically — adding metrology, lithography specifics, heterogeneous integration, DTCO/STCO, and photonics to the keyword mix. This shift shows ASML moving from equipment-centric R&D toward full system-level integration where chip design and manufacturing process must be co-optimized.
ASML is moving beyond pure lithography equipment toward full-stack semiconductor system engineering, including design-technology co-optimization and heterogeneous integration — expect future collaborations to require broader multidisciplinary expertise.
How they like to work
ASML overwhelmingly leads its projects: 7 of 11 as coordinator, with only 2 as participant and 2 as third party. With 231 unique consortium partners across 25 countries, they operate as a major hub in the European semiconductor R&D network. Their coordination style involves large, well-funded consortia (averaging EUR 5.4M in EC funding per project), making them an anchor partner that assembles and drives multi-year industrial pilotlines rather than joining others' initiatives.
ASML has built one of the most extensive collaboration networks in European semiconductor R&D, partnering with 231 unique organizations across 25 countries. This pan-European reach reflects the complex supply chain of semiconductor manufacturing, drawing in equipment suppliers, materials companies, research institutes, and chipmakers from across the continent.
What sets them apart
ASML is not just a participant in European semiconductor R&D — it is the central orchestrator. No other organization in H2020 has coordinated a continuous series of projects tracking the semiconductor roadmap node by node from 7nm to 2nm. For any consortium targeting advanced manufacturing, photonics, or nanoscale technology in Europe, ASML brings unmatched industrial credibility, a vast partner network, and the ability to anchor large-scale pilotline projects with real production relevance.
Highlights from their portfolio
- TAKE5Largest single EC contribution (EUR 9.45M) in ASML's portfolio, targeting the critical 5nm technology node that became the industry standard for high-performance chips.
- IT2Marks ASML's push to the 2nm frontier with the broadest keyword scope of any project, spanning lithography, metrology, photonics, DTCO, and Moore's Law — signaling a shift to full system-level R&D.
- SeNaTeThe starting point of ASML's H2020 node-progression series at 7nm (EUR 8.6M), establishing the coordinated pilotline model that all subsequent projects followed.